Intensity modulation based optical proximity optimization for the maskless lithography
نویسندگان
چکیده
منابع مشابه
Absorbance-modulation optical lithography.
We describe a new mode of optical lithography called absorbance-modulation optical lithography (AMOL) in which a thin film of photochromic material is placed on top of a conventional photoresist and illuminated simultaneously by a focal spot of wavelength lambda1 and a ring-shaped illumination of wavelength lambda2. The lambda1 radiation converts the photochromic material from an opaque to a tr...
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Future lithography systems must produce more dense chips with smaller feature sizes, while maintaining the throughput of one wafer per sixty seconds per layer achieved by today’s optical lithography systems. To achieve this throughput with a direct-write maskless lithography system, using 25 nm pixels for 50 nm feature sizes, requires data rates of about 10 Tb/s. In a previous paper, we present...
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Future lithography systems must produce more dense chips with smaller feature sizes, while maintaining throughput comparable to today’s optical lithography systems. This places stringent data-handling requirements on the design of any maskless lithography system. Today’s optical lithography systems transfer one layer of data from the mask to the entire wafer in about sixty seconds. To achieve a...
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ژورنال
عنوان ژورنال: Optics Express
سال: 2020
ISSN: 1094-4087
DOI: 10.1364/oe.381503